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29. Sodium nitrite is classified as (a) chemical antidote (b) physiological antidote (c) mechanical antidote (d) all the above 30. Impurities in pharmaceutical preparation may be due to following sources: (a) Raw material (b) Manufacturing process (c) Chemical instability (d) All of the above (a) Ca2+ (b) Hg+ (c) I+ (d) Cu+ 31. Pharmaceutical buffer system could be categorizes into (a) 1 (b) 2 (c) 3 (d) none of these 32. Topical agent depending upon their action or used divided into (a) protective (b) antimicroliol (c) astringent (d) all of these 33. ZnO is used as (a) protective (b) astringent (c) both (a) &(b) (d) antidote 34. Inorganic antimicrobial agent can be divided into (a) oxidation (b) halogenation (c) protein precipitate (d) all of the above 35. Compounds capable of function as antimicrobial agent through oxidative mechanism are (a) H2O2 (b) halogen (c) KMnO4 (d) all of these 36. Halogenation mechanism occurring with antiseptic are (a)hypohalite (b) sulphydryl

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29. Sodium nitrite is classified as (a) chemical antidote (b) physiological antidote (c) mechanical antidote (d) all the above 30. Impurities in pharmaceutical preparation may be due to following sources: (a) Raw material (b) Manufacturing process (c) Chemical instability (d) All of the above (a) Ca2+ (b) Hg+ (c) I+ (d) Cu+ 31. Pharmaceutical buffer system could be categorizes into (a) 1 (b) 2 (c) 3 (d) none of these 32. Topical agent depending upon their action or used divided into (a) protective (b) antimicroliol (c) astringent (d) all of these 33. ZnO is used as (a) protective (b) astringent (c) both (a) &(b) (d) antidote 34. Inorganic antimicrobial agent can be divided into (a) oxidation (b) halogenation (c) protein precipitate (d) all of the above 35. Compounds capable of function as antimicrobial agent through oxidative mechanism are (a) H2O2 (b) halogen (c) KMnO4 (d) all of these 36. Halogenation mechanism occurring with antiseptic are (a)hypohalite (b) sulphydryl

29. Sodium nitrite is classified as (a) chemical antidote (b) physiological antidote (c) mechanical antidote (d) all the above 30. Impurities in pharmaceutical preparation may be due to following sources: (a) Raw material (b) Manufacturing process (c) Chemical instability (d) All of the above (a) Ca2+ (b) Hg+ (c) I+ (d) Cu+ 31. Pharmaceutical buffer system could be categorizes into (a) 1 (b) 2 (c) 3 (d) none of these 32. Topical agent depending upon their action or used divided into (a) protective (b) antimicroliol (c) astringent (d) all of these 33. ZnO is used as (a) protective (b) astringent (c) both (a) &(b) (d) antidote 34. Inorganic antimicrobial agent can be divided into (a) oxidation (b) halogenation (c) protein precipitate (d) all of the above 35. Compounds capable of function as antimicrobial agent through oxidative mechanism are (a) H2O2 (b) halogen (c) KMnO4 (d) all of these 36. Halogenation mechanism occurring with antiseptic are (a)hypohalite (b) sulphydryl

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29. Sodium nitrite is classified as<br />(a) chemical antidote<br /><br />30. Impurities in pharmaceutical preparation may be due to following sources:<br />(d) All of the above<br /><br />31. Pharmaceutical buffer system could be categorized into<br />(b) 2<br /><br />32. Topical agent depending upon their action or used divided into<br />(d) all of these<br /><br />33. ZnO is used as<br />(c) both (a) & (b)<br /><br />34. Inorganic antimicrobial agent can be divided into<br />(d) all of the above<br /><br />35. Compounds capable of functioning as antimicrobial agents through an oxidative mechanism are<br />(d) all of these<br /><br />36. Halogenation mechanism occurring with antiseptics is<br />(a) hypohalite
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